1. Product DescriptionItem nameHigh Purity 99.995% Titanium IngotMaterial4N5 (99.995%)Other Normal materialGR1、GR2、GR3、GR4、GR5、Ti 6Al 4V ELI、 GR7、GR11、GR12、GR23; 5N (99.999%)StandardASTM B 381, ASTMB348, AMS4928, ASTM F67, ASTM F136 etc.Test Chemical composition, mechanical property etc Production Method Vacuum meltingApplicationFurther MachiningRelated ProductsTitanium Bar, Plate, Tube, Wire, Flange, Ring etc.Machining parts as per customer drawing is also available. High-purity titanium 4N5(purity: 99.995%) and 5N (purity:99.999%) are used as sputtering target material for thin-film formations of semiconductors including DRAMs. This titanium contributes towards improved semiconductor performance. Example of Specifications (4N5)                                                                    [Ti : % min., others : ppm max.]TiFeNiCrMnAlSiSnCuNaKOCGuaranteed99.99515105555550.050.0550050TypicalBalance53<1<1<1<1<1<1<0.05<0.0525020• Gaseous contents are not counted as impurity.• Specifications are to be met with specific requirements from individual customers.　 2. Application Industry◆Aerospace Industry   Engines and parts material for aircraft, and space rockets◆Power Industry and Desalination   Thermal and nuclear power plants, desalination plants◆Chemical Industry   Chemical plants (reactors, pipes, heat exchangers, valves, etc.)◆Ocean Development   Ocean platforms, ship hulls, bridges, rigs◆Civil Engineering and Construction   Roofing, curtain-walls, monuments◆Motor Industry   Engine parts, motorcycles◆Medical